Technical Information Magazine 202401-02 Analysis of Metal Particles in Photoresist
This paper introduces the principle of sspICP-MS and presents a case study on the measurement of metal particles in photoresist.
The technical information magazine The TRC News provides the latest information on analytical techniques that are useful for research and development, solving production troubles, and quality control. **Abstract** Single Particle ICP-MS (hereafter spICP-MS) is a method that utilizes the high sensitivity and elemental selectivity of ICP-MS to detect tiny and trace particles containing specific metals, allowing for the acquisition of their concentration and particle size distribution. This article introduces the principles of spICP-MS and presents a case study measuring metal particles in photoresist. **Table of Contents** 1. Introduction 2. Principles and Features of spICP-MS 3. Direct Introduction Method for Organic Solvents 4. Analysis of Al, Fe, and Cu Particles in Photoresist 5. Conclusion
- Company：東レリサーチセンター
- Price：Less than 10,000 yen
